Draft Amendments to Measures on Compulsory Patent Licensing Open to Comments 

On 12 October 2011, a circular to solicit public comments on the Amendments to the Measures on Compulsory Patent Licensing (Draft for Comments) was issued by the State Intellectual Property Office (SIPO) of China. 

The draft amendments are written on the basis of the Measures on Compulsory Patent Licensing (2003) and the Measures on Compulsory Patent Licensing concerning Public Health Problems (2006) in consolidation, with a view to implement the provisions relating to compulsory licensing of patents in China’s revised Patent Law and Implementing Rules of the Patent Law promulgated in 2008 and 2010 respectively.  

The draft amendments are open to public comments until 13 November 2011.